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Interfacial interaction behaviour analysis between Cu/Ru films and... |  Download Scientific Diagram
Interfacial interaction behaviour analysis between Cu/Ru films and... | Download Scientific Diagram

Ultrafast Time-Resolved Pump–Probe Investigation of Nanosecond Extreme  Ultraviolet-Light-Induced Damage Dynamics on B4C/Ru Nano-Bilayer Film |  Nano Letters
Ultrafast Time-Resolved Pump–Probe Investigation of Nanosecond Extreme Ultraviolet-Light-Induced Damage Dynamics on B4C/Ru Nano-Bilayer Film | Nano Letters

The effect of temperature and bias on the energy storage of a Ru/YSZ/Ru  thin-film device - ScienceDirect
The effect of temperature and bias on the energy storage of a Ru/YSZ/Ru thin-film device - ScienceDirect

Ru nucleation and thin film smoothness improvement with ammonia during  chemical vapor deposition: Journal of Vacuum Science & Technology A: Vol  34, No 3
Ru nucleation and thin film smoothness improvement with ammonia during chemical vapor deposition: Journal of Vacuum Science & Technology A: Vol 34, No 3

Catalysts | Free Full-Text | Plasma-Deposited Ru-Based Thin Films for  Photoelectrochemical Water Splitting | HTML
Catalysts | Free Full-Text | Plasma-Deposited Ru-Based Thin Films for Photoelectrochemical Water Splitting | HTML

CMP performance for Cu and Ru films as a function of inhibitor... |  Download Scientific Diagram
CMP performance for Cu and Ru films as a function of inhibitor... | Download Scientific Diagram

SEM images of Ru films deposited at T dep = 198°C, and deposition... |  Download Scientific Diagram
SEM images of Ru films deposited at T dep = 198°C, and deposition... | Download Scientific Diagram

Dependence of Ru film thickness and resistivity on the amount of ALD... |  Download Scientific Diagram
Dependence of Ru film thickness and resistivity on the amount of ALD... | Download Scientific Diagram

Enhanced selectivity of atomic layer deposited Ru thin films through the  discrete feeding of aminosilane inhibitor molecules - ScienceDirect
Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules - ScienceDirect

BALD Engineering - Born in Finland, Born to ALD: Low temperature ALD of  Rutheium using H2O as co-reactant
BALD Engineering - Born in Finland, Born to ALD: Low temperature ALD of Rutheium using H2O as co-reactant

Catalysts | Free Full-Text | Plasma-Deposited Ru-Based Thin Films for  Photoelectrochemical Water Splitting | HTML
Catalysts | Free Full-Text | Plasma-Deposited Ru-Based Thin Films for Photoelectrochemical Water Splitting | HTML

Schematic models of AB-type Ru ALD using the sequences Ru(EtCp) 2 −O 2... |  Download Scientific Diagram
Schematic models of AB-type Ru ALD using the sequences Ru(EtCp) 2 −O 2... | Download Scientific Diagram

XRD patterns of the Ru films on TaN (5 nm)/Si with different growth... |  Download Scientific Diagram
XRD patterns of the Ru films on TaN (5 nm)/Si with different growth... | Download Scientific Diagram

PDF] Growth and nanostructure of conformal ruthenium films by liquid-source  metalorganic chemical vapor deposition by Sandwip Dey, Jaydeb Goswami, A.  Das, Wei Cao, M. Floyd, Ray Carpenter · OA.mg · 10.1063/1.1576513
PDF] Growth and nanostructure of conformal ruthenium films by liquid-source metalorganic chemical vapor deposition by Sandwip Dey, Jaydeb Goswami, A. Das, Wei Cao, M. Floyd, Ray Carpenter · OA.mg · 10.1063/1.1576513

Color online) (a) Dependence of Ru film thickness per cycle and the... |  Download Scientific Diagram
Color online) (a) Dependence of Ru film thickness per cycle and the... | Download Scientific Diagram

SEM measured Ru film thickness vs deposition process cycle number at... |  Download Scientific Diagram
SEM measured Ru film thickness vs deposition process cycle number at... | Download Scientific Diagram

Enhanced Electrical Properties of an Al-Doped TiO2 Dielectric Film on a TiN  Electrode by Adopting an Atomic Layer Deposited Ru Interlayer | ACS Applied  Electronic Materials
Enhanced Electrical Properties of an Al-Doped TiO2 Dielectric Film on a TiN Electrode by Adopting an Atomic Layer Deposited Ru Interlayer | ACS Applied Electronic Materials

Electrochemical interaction evaluation between Cu/Ru films and... |  Download Scientific Diagram
Electrochemical interaction evaluation between Cu/Ru films and... | Download Scientific Diagram

Catalysts | Free Full-Text | Plasma-Deposited Ru-Based Thin Films for  Photoelectrochemical Water Splitting | HTML
Catalysts | Free Full-Text | Plasma-Deposited Ru-Based Thin Films for Photoelectrochemical Water Splitting | HTML

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects | Chemistry of  Materials
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects | Chemistry of Materials

Resistivity vs thickness for c-axis single crystal Ru films deposited... |  Download Scientific Diagram
Resistivity vs thickness for c-axis single crystal Ru films deposited... | Download Scientific Diagram

Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes:  Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen  Evolution Reaction - Zanders - Advanced Materials Interfaces - Wiley Online  Library
Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction - Zanders - Advanced Materials Interfaces - Wiley Online Library

Coatings | Free Full-Text | Growth of Atomic Layer Deposited Ruthenium and  Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen |  HTML
Coatings | Free Full-Text | Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen | HTML

Ultrafast Time-Resolved Pump–Probe Investigation of Nanosecond Extreme  Ultraviolet-Light-Induced Damage Dynamics on B4C/Ru Nano-Bilayer Film |  Nano Letters
Ultrafast Time-Resolved Pump–Probe Investigation of Nanosecond Extreme Ultraviolet-Light-Induced Damage Dynamics on B4C/Ru Nano-Bilayer Film | Nano Letters

Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru  Precursor and H2O as a Reactant | Chemistry of Materials
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H2O as a Reactant | Chemistry of Materials

Electrochemical Growth of Cu(Ru) Films via Underpotential Deposition of Pb,  Surface-Limited Redox Replacement of Cu, and Underpotential Deposition of Ru  | SpringerLink
Electrochemical Growth of Cu(Ru) Films via Underpotential Deposition of Pb, Surface-Limited Redox Replacement of Cu, and Underpotential Deposition of Ru | SpringerLink