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Ru nucleation and thin film smoothness improvement with ammonia during chemical vapor deposition: Journal of Vacuum Science & Technology A: Vol 34, No 3
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PDF] Growth and nanostructure of conformal ruthenium films by liquid-source metalorganic chemical vapor deposition by Sandwip Dey, Jaydeb Goswami, A. Das, Wei Cao, M. Floyd, Ray Carpenter · OA.mg · 10.1063/1.1576513
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